Thin films of vanadium oxide were deposited on glass substrates at 450 degrees C by atmospheric pressure chemical vapour deposition. The effect of the vanadium tetrachloride to water precursor ratio on the structural and morphological properties of the films was investigated. The water concentration was observed to strongly affect the vanadium oxidation state and the morphological characteristics of the films. The importance of achieving single-phase of a particular oxidation state towards the improvement of the electrochemical performance of thin films grown by atmospheric pressure CVD is highlighted. (C) 2011 Elsevier B.V. All rights reserved.