Micro and nano-structuration of silicon by femtosecond laser: Application to silicon photovoltaic cells fabrication

Halbwax M; Sarnet T; Delaporte P; Sentis A; Etienne H; Torregrosa F; Vervisch V; Perichaud I; Martinuzzi S

Thin Solid Films, Vol.516, No.20, 6791-6795, 2008

DOI10.1016/j.tsf.2007.12.117 Export Citation

Micro and nano-structuration of silicon by femtosecond laser: Application to silicon photovoltaic cells fabrication

Halbwax M, Sarnet T, Delaporte P, Sentis A, Etienne H, Torregrosa F, Vervisch V, Perichaud I, Martinuzzi S

We have prepared absorbing structures for photovoltaic cells with different nanotexturization, obtained by means of a femtosecond laser,without the use of corrosive gas (under vacuum). To take in account the 3D structured front surface, the emitter doping has been realized by using Plasma Immersion Ion Implantation (so-called PULSION). The results show a photocurrent increase of about 30% in the laser textured zones. (c) 2008 Elsevier B. V. All rights reserved.

Keywords:nanotexturization;black silicon;photocurrent;femtosecond laser;plasma immersion doping