Thin Solid Films, Vol.516, No.23, 8453-8461, 2008
Elemental distribution and morphological analysis of layered metallic systems: Application to Co-Sn evaporated multilayers
Aim of this work is the study of growth and morphological characterization of the pseudo spin-valve Si/Co(15 nm)/Sn(40 nm)/Co(15 nm), namely a structure based on the stacking of three metallic thin films, two ferromagnetic (FM) separated by a nonmagnetic different material. in our case Sri diamagnetic metal was chosen to magnetically decouple the two FM layers. Thermal evaporation was chosen as experimental deposition technique for its versatility and cost effectiveness looking at prospective industrial application. In this paper a detailed analysis concerning the distribution and homogeneity of the Co and Sri atomic species by means of field effect scanning electron microscopy and energy dispersive X-ray spectroscopy (EDX) will be provided. A correlation of the two investigated areas by means of a numerical procedure will also be accomplished. A simple physical simulation for X photon scattering processes inside a material whose morphology mimics that of our sample will be implemented, in order to provide a possible explanation for the correlations and to verify the robustness of our numerical method. The simulated EDX pattern so obtained, when correlated, will be shown to reproduce the experimental results with a very good agreement. (C) 2008 Elsevier B.V. All rights reserved.
Keywords:Field emission microscopy;Evaporation;Surface morphology;Multilayers;Numerical methods;Energy dispersive X-ray microscopy