Polymethylmethacrylate (PMMA) thin films containing Yb(pms)(3)(H(2)O)(8) (pms: bis(perfluoromethanesulfonyl)imide) and dipyridophenazine with DMSO and DMSO-d(6) were fabricated on the glass substrates. The films show photosensitized near-IR luminescence under UV light irradiation of 370 nm in wavelength. The emission quantum yields of Yb(III) complex in PMMA (film 1), PMMA containing DMSO (film 2), and PMMA containing DMSO-d(6) (film 3) thin films are 0.18,0.26, and 0.26%, respectively. The emission quantum yields of films 1 and 2 were considerably enhanced after the annealing at 80 degrees C. (c) 2008 Elsevier B.V. All rights reserved