Micro-indentation and HF etching were explored as micro-fabrication techniques applied to glass surfaces. The effects of the aluminosilicate glass composition and of the etching conditions on the etching rate were investigated. It was found that the etching rate increased with increasing the ratio of Al(2)O(3) to SiO(2) in the aluminosilicate glass. Etching parameters, such as pH, concentration and temperature of HF acid, had effects on etching rate. However, the effects of these parameters were much smaller at indented area than at non-indented area. The results indicated that the etching rate difference between the two areas, which is one of the key factors in the micro-fabrication technique, could be controlled with these parameters. And the phenomena can be well explained in terms of etching and leaching mechanism of aluminosilicate glass. (C) 2008 Elsevier B.V. All rights reserved.