Thin Solid Films, Vol.517, No.14, 4192-4195, 2009
Modification of low temperature deposited LiMn2O4 thin film cathodes by oxygen plasma irradiation
Lithium manganese oxides have been deposited by radio frequency magnetron sputter deposition with relatively lower annealing temperatures and then post-treated with a radio frequency (rf) driven oxygen plasma. Following oxygen plasma irradiation, the film properties were modified, and the performance of the thin film cathode has been enhanced. The electrochemical properties of the treated thin-film cathodes were characterized and compared. The results showed that the samples with moderate plasma treatment also maintained good cyclic properties as cycled at a wide range potential window of 2.0 V-4.5 V. Its electrochemical properties were significantly improved by this process, even though the films were prepared under low annealing temperature. (C) 2009 Elsevier B.V. All rights reserved.
Keywords:Lithium manganese oxide;Plasma treatment