Thin Solid Films, Vol.517, No.16, 4515-4519, 2009
Direct patterning of dense cerium oxide thin film by developed ink-jet deposition method at moderate temperatures
Direct fabrication of ceria film and patterns were conducted by an ink-jet deposition method where a precursor solution was jetted towards a heated substrate (<= 300 degrees C) according to the required pattern without any post heat treatments. X-ray diffraction and Raman spectroscopic analyses revealed that the formed phases were crystallized CeO(2) without any impurity phases and consisted of nanosized crystallites of <10 nm. The thicknesses were several hundred nanometers and the width of the patterns was about 350 pm. The film was dense and showed a high optical transparency in the visible region(>90%). Scanning electron microscopic analysis revealed that thin film patterns were free of cracks and all the films showed good adherence to the substrate. (C) 2008 Elsevier B.V. All rights reserved.