We investigated the effects of a high density O(2) Plasma treatment on the structural and electrical properties of sputter-deposited GZO films. The GZO films were deposited on polyimide substrate without substrate heating by RF magnetron sputtering from a ZnO target mixed with 5 wt.% Ga(2)O(3). Prior to the GZO film growth, we treated a polyimide substrate with highly dense inductively coupled oxygen plasma. The optical transmittance of the GZO film, about 80%. was maintained regardless of the plasma pre-treatment. However, the resistivity of the film was strongly influenced by the plasma pre-treatment. The resistivity of the GZO film decreased from 1.02 x 10(-2) Omega cm without an O(2) plasma pre-treatment to 1.89 x 10(-3) Omega cm with an O(2) plasma pre-treatment. (C) 2009 Elsevier B.V. All rights reserved.