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Thin Solid Films, Vol.518, No.1, 1-5, 2009
Microstructural study of SnO2 thin layers deposited on sapphire by sol-gel dip-coating
Tin oxide (SnO2) films have been grown onto (006) sapphire substrates by sol-gel dip-coating using tin alkoxide solutions. It is shown, using grazing-incidence X-ray diffraction, reciprocal space mapping and atomic force microscopy, that thermal annealing at 500 degrees C induces the crystallization of SnO2 in the rutile-type phase. Further annealing treatments at temperatures lower than 1100 degrees C give rise to slow grain growth controlled by surface diffusion, whereas rapid grain growth (controlled by an evaporation-condensation mechanism) takes place at temperatures higher than 1100 degrees C. Concomitantly, the film splits into isolated islands and a fibre texture occurs at higher temperatures. (C) 2009 Elsevier B.V. All rights reserved.
Keywords:Tin oxide;Microstructure;Sol-gel deposition;X-ray diffraction;Atomic force microscopy;Annealing