Thin Solid Films, Vol.518, No.9, 2569-2572, 2010
Structural study of Si1-xGex nanocrystals embedded in SiO2 films
We have investigated the structural properties of Si1-xGex nanocrystals formed in an amorphous SiO2. matrix by magnetron sputtering deposition The influence of deposition parameters on nanocrystal size, shape, arrangement and internal structure was examined by X-ray diffraction, Raman spectroscopy, grazing incidence small angle X-ray scattering, and high resolution transmission electron microscopy We found conditions for the formation of spherical Si1-xGex nanocrystals with average sizes between 3 and 13 nm. uniformly distributed in the matrix In addition we have shown the influence of deposition parameters oil average nanocrystal size and Ge content x. (c) 2009 Elsevier B.V. All rights reserved.