Titanium dioxide films were prepared by ultrasonic spray pyrolysis on (0001) alpha-quartz substrates at 400 degrees C and/or annealed in air at 600 degrees, 800 degrees, or 1000 degrees C. The as-deposited films at 400 degrees C (50 nm grains) and annealed at 600 degrees C (100 nm grains) showed single-phase anatase of high transparency in the visible region. Films annealed at 800 degrees C and 1000 degrees C showed mixed-phase anatase (100 nm grains) plus rutile (700 nm agglomerates) and pure rutile, (700 nm grains), respectively. Raman and X-ray data indicate the presence of residual stress in the films, which may arise from contamination, silicon diffusion into the films, and/or oxygen deficiency. (C) 2009 Elsevier B.V. All rights reserved.