Thin Solid Films, Vol.518, No.15, 4273-4280, 2010
A study of the nanostructure and hardness of electron beam evaporated TiAlBN Coatings
TiAlBN coatings have been deposited by electron beam (EB) evaporation from a single TiAlBN material source onto AISI 316 stainless steel substrates at a temperature of 450 degrees C and substrate bias of - 100 V. The stoichiometry and nanostructure have been studied by X-ray photoelectron spectroscopy, X-ray diffraction and transmission electron microscopy. The hardness and elastic modulus were determined by nanoindentation. Five coatings have been deposited, three from hot-pressed TiAlBN material and two from hot isostatically pressed (HIPped) material. The coatings deposited from the hot-pressed material exhibited a nanocomposite nc-(Ti,Al)N/a-BN/a-(Ti,Al)B(2) structure, the relative phase fraction being consistent with that predicted by the equilibrium Ti-B-N phase diagram. Nanoindentation hardness values were in the range of 22 to 32 GPa. Using the HIPped material, coating (Ti,Al)B(0.29)N(0.46) was found to have a phase composition of 72-79 mol.% nc-(Ti,Al)(N,B)(1-x) + 21-28 mol% amorphous titanium boride and a hardness of 32 GPa. The second coating, (Ti,Al)B(0.66)N(0.25), was X-ray amorphous with a nitride+boride multiphase composition and a hardness of 26 GPa. The nanostructure and structure-property relationships of all coatings are discussed in detail. Comparisons are made between the single-ER coatings deposited in this work and previously deposited twin-EB coatings. Twin-EB deposition gives rise to lower adatom mobilities, leading to (111) (Ti,Al)N preferential orientation, smaller grain sizes, less dense coatings and lower hardnesses. (C) 2010 Elsevier B.V. All rights reserved.
Keywords:Nanocomposites;Thin films;Hardness;TiAlBN;X-ray photoelectron spectroscopy;X-ray diffraction;Transmission electron microscopy