Periodically wrinkled stiff thin films on elastomeric substrates have been found extensive applications such as in stretchable electronics This paper presents a cost-effective and simple method to form wrinkled stiff SiO(x) thin films on polydimethylsiloxane (PDMS) substrates at room temperature by ultraviolet/ozone (UV/O) radiation on pre-strained PDMS Systemic studies have been conducted to understand the dependence of the wavy profile on the PDMS pre-strain UV/O exposure time and PDMS modulus The mechanics analysis has been verified to be quantitatively or qualitatively accurate by experimental comparisons The wrinkled SiO(x)/PDMS system is stretchable and provides a wavy mold for stretchable electrodes The constant electrical resistance during mechanical stretching shows the stretchability of this system (c) 2010 Elsevier B V All rights reserved