We report the formation of a self-organized dendritic pattern of nanometer thickness in polymer Langmuir-Blodgett (LB) films. Poly(N-dodecylacrylamide) (pDDA)/chloroform solution was spread on a water surface to form a stable polymer monolayer. A pDDA monolayer was deposited onto a hydrophilic silicon substrate by upward deposition from a water subphase, and a second layer was then deposited by downward deposition. The substrate with the two layers was withdrawn from a clean water surface at a high speed to form the dendritic pattern, which was imaged by atomic force microscopy. The height of the pattern, 3.5 nm, corresponds to the height of a bilayer pDDA LB film, suggesting that the pattern forms when the deposited outermost layer overturns by meniscus oscillation. A similar dendritic structure of narrower width and lower height was fabricated on a hydrophobic silicon substrate. (C) 2010 Elsevier B.V. All rights reserved.