The growth of Ge-Si and Ge-Si nanowire (NW) heterostructures was demonstrated via chemical vapor deposition. Due to the influence of interface energy, differing topographies of the heterostructures were observed. On initially grown Ge NWs, numerous Si NW branches were grown near the tip due to Au migration. However, on initially grown Si NWs, high-density Ge nanodots were observed. (C) 2011 Elsevier B.V. All rights reserved.