Our recent investigations have identified a pathway to produce transparent conducting oxide (TCO) films that demonstrate higher infrared transparency. The technique involves controlling the dielectric permittivity of the TCO film such that the electrical properties are maintained, but the plasma frequency (omega(p)) is shifted to longer wavelength. This has the effect of reducing free-carrier absorption in the visible and near-infrared spectral region, thus producing a TCO film with higher optical transmission. The technique has been demonstrated for sputtered films of indium tin oxide by adding small amounts of ZrO(2) to a ceramic sputtering target, and for SnO(2):F films deposited by chemical vapor deposition using a metalorganic Zr source. (C) 2011 Elsevier B.V. All rights reserved.