Thin Solid Films, Vol.519, No.22, 8154-8160, 2011
Growth of highly textured aluminum films on LiTaO3 with optimized titanium intermediate layers
Ultra thin titanium films in the range of a few nanometers have been deposited on monocrystalline lithiumtantalate (LiTaO3) followed by deposition of 400 nm pure aluminum (Al). Texture measurements by means of electron backscatter diffraction show that the thickness of the intermediate titanium (Ti) layer significantly influences texture and grain structure of the overlying Al film. Increasing the thickness of the Ti layer from 0 nm to 20 nm leads to a change of aluminums texture from unoriented polycrystalline over highly oriented in single direction to highly oriented in twin structure. (C) 2011 Elsevier B.V. All rights reserved.
Keywords:Epitaxy;Aluminum;Titanium;Lithium tantalate;Scanning Electron Microscopy;Atomic Force Microscopy;Electron backscatter diffraction;Electron beam evaporation