Thin Solid Films, Vol.520, No.3, 1041-1047, 2011
Carbon nanotube integrated 3-dimensional carbon microelectrode array by modified SU-8 photoresist photolithography and pyrolysis
An integration strategy is devised for a reliable and scalable assembly of carbon nanotubes in photoresist-derived glassy-like carbon microelectrodes. The approach involves UV photolithography process with carbon nanotube monodispersed photoresist followed by high temperature pyrolysis process, and is versatile in yielding various 3-dimensional micro-nano integrated carbon microelectrode arrays. The morphology of the micro-nano integrated structures is characterized. The integrated microelectrodes demonstrate better electrical performance than the blank microelectrodes, showing potential applications in high-sensitive chemical and biological detection systems. The developed method represents a low-cost and facile way to mass production of carbon nanotube-integrated carbon microelectrode array. (C) 2011 Elsevier B.V. All rights reserved.
Keywords:Carbon nanotubes;Microelectrode array;Lithography;Su-8 Resin;Pyrolysis;Current-voltage measurements;Scanning electron microscopy