화학공학소재연구정보센터
Thin Solid Films, Vol.520, No.21, 6626-6630, 2012
Effect of high-temperature annealing on the optical and photoluminescence properties of nanocrystalline SiC films
The optical and photoluminescence (PL) properties of nanocrystalline 3C-SiC films and the effect of the boundary regions between the nanocrystals were studied for two sets of films: (a) films with 10-15 nm nanocrystal size obtained by direct ion deposition method and (b) similar films annealed in oxygen at 850-950 degrees C. It was shown that annealing of the nanocrystalline SiC films resulted in weaker absorption in a broad spectral range, and to the increase of the optical band gap from 1.8 to 2.2 eV. On the contrary, the edge PL bands in the UV range (2.2 to 2.4 eV) remained similar. In the IR range, three maxima absent in the as-grown films, appeared at 1.52 eV, 1.56 eV and 1.63 eV. Measurement of the intensity of PL maxima as a function of the excitation power showed a nonlinear dependence that was attributed to the onset of stimulated emission. (C) 2012 Elsevier B.V. All rights reserved.