Journal of Applied Polymer Science, Vol.71, No.11, 1749-1751, 1999
Study on the spatial resolution of a furfuryl alcohol-negative photoresist using a holographic system
A negative photoresist was obtained from furfury alcohol using methylene dichloride as a solvent and trifluoracetic acid as a catalyst. A holographic assembly with a blue laser failed to give interference patterns. However, a periodic interference pattern was printed on a film of furfuryl alcohol resin using an ultraviolet laser with a coherent beam at 360 nm. The period of the pattern was reproduced throughout the film and resulted about 0.46 mu m. Thus, the resin obtained was able to reach a resolution about 0.23 m.
Keywords:TRIFLUOROACETIC-ACID;POLYMERIZATION