Chemical Engineering Communications, Vol.199, No.12, 1575-1595, 2012
Emulsion Liquid Membrane Pertraction of Metal Ions from Aqueous Solutions and Electroplating Effluent Using Rotating Disk Contactor
Removal of chromium (III), copper (II), and zinc (II) from synthetic aqueous solutions and electroplating wastewater by an emulsion liquid membrane technique (ELM) was studied using a rotating disk contactor (RDC). Kerosene as diluent, Span 80 as surfactant, di-(2ethyl hexyl) phosphate (D2EHPA) as carrier, and 1N H2SO4 solution as internal stripping phase were used for emulsion preparation. RDC provides relatively low shear to emulsion and thus minimizes rupture of the ELM. Various hydrodynamic and chemical parameters such as metal ion concentration in the continuous (feed) phase, pH of the continuous phase, carrier concentration, agitation speed, internal stripping agent concentration, and flow rate ratio of continuous phase to dispersed phase (treat ratio) have been experimentally investigated. The results showed that it is possible to remove more than 95% of all metal ions from aqueous solutions with a concentration factor of more than 35 and a removal of 68-74% of three metal ions from the electroplating effluent.
Keywords:Chromium (III);Copper (II);Emulsion liquid membrane;Pertraction;Rotating disk contactor;Zinc (II)