Polydopamine (PDA) bearing surface catechol groups on a silicon wafer was used to induce the deposition of thin TiO2 films from aqueous solution. Different deposition conditions, such as the concentration and pH of precursor solution as well as the deposition temperature, were adopted. It was found that the growth rate and crystalline phase can be controlled by these deposition parameters; moreover, the crystal growth and adhesion strength to the substrate of TiO2 film can be promoted by PDA layer.