화학공학소재연구정보센터
Industrial & Engineering Chemistry Research, Vol.51, No.34, 11147-11156, 2012
Selective Area Chemical-Deposition Process: An Innovative and Facile Route to Prepare Pm-147 Sources for Dust Monitors
The potential utility of selective area chemical-deposition technique in the preparation of Pm-147 source for the measurement of particulate emission in air was demonstrated. The process consists of electrodeposition of Ni on a precisely defined surface area of a copper wire followed by deposition of Pm-147 activity from an aqueous solution. The influences of various experimental parameters such as pH of the aqueous solution, deposition time and reaction volume were systematically investigated for the optimum deposition of Pm-147. To prevent leaching of Pm-147 from the source, we subsequently sheathed the radioactive area with a thin layer of polystyrene. The deposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), and atomic force microscopy (AFM) analyses. The quality of the prepared sources in compliance with regulatory norms were evaluated to ensure their safety during application and found to be satisfactory.