The heating behavior of LaNiO3 (LNO) films on SiO2/Si substrate heated by 2.45 GHz microwave irradiation in the microwave magnetic field was first investigated, and then amorphous Pb(Zr0.52Ti0.48)O3 (PZT) thin films were deposited on LNO-coated SiO2/Si substrates by a sol-gel method and crystallized in the microwave magnetic field. The crystalline phases and microstructures as well as the electrical properties of the PZT films were investigated as a function of the elevated temperature generated by microwave irradiation. The perovskite PZT films with a highly (100)-preferred orientation can be obtained by microwave annealing at 700 degrees C for only 180 s of total processing time, and have good electrical properties. The results demonstrated that conductive metal oxide LNO as a bottom electrode layer is an advantage for the crystallization of PZT thin films by microwave irradiation in the microwave magnetic field.