A simple and fast method is demonstrated for the preparation of a thin film of graphene layers by the electrodeposition of positively doped graphene dispersion onto desired electrode substrates. A thin film of graphene layers was obtained by applying negative potentials according to the electrophoretic deposition mechanism. The doped graphene dispersion was prepared from expanded graphite treatment with various acids (HCl, HNO3, and H2SO4) and an ultrasonication process. The doping and deposition processes are strongly dependent on the type of acid and the applied potential, which were monitored by Raman spectroscopy and quartz crystal microbalance, respectively. The morphology and electrochemical properties of the graphene film were characterized by scanning electron microscopy and cyclic voltammetry. The electrochemical performance of graphene film obtained using nitric acid or hydrochloric acid dopant is superior to that obtained with sulfuric acid doping. This technique could be a facile tool for the fabrication of a thin film of graphene layers on a desired substrate.