Journal of Polymer Science Part A: Polymer Chemistry, Vol.51, No.18, 3873-3880, 2013
Photoinduced depolymerization of poly(olefin sulfone)s possessing photobase generator side-chains: Effect of spacer-chain length
Photoinduced depolymerization of poly(olefin sulfone) s possessing photobase generators in the side-chain was investigated. Irradiation with UV light generated base on the side-chains and induced depolymerization based on proton abstraction on the main-chain. The effect of the length of the spacer chain, which connects the photobase-generating moiety to the polymer main chain on the photoinduced depolymerization, also was investigated. (C) 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2013, 51, 3873-3880
Keywords:degradation;lithography;photobase generator;photoinduced depolymerization;photoresists;poly(olefin sulfone)s