Sulfonated multi-walled carbon nanotubes for the removal of copper (II) from aqueous solutions

Yuanyuan Ge; Zhili Li; Duo Xiao; Piao Xiong; Na Ye

Journal of Industrial and Engineering Chemistry, Vol.20, No.4, 1765-1771, July, 2014

DOI10.1016/j.jiec.2013.08.030 Export Citation

Sulfonated multi-walled carbon nanotubes for the removal of copper (II) from aqueous solutions

Yuanyuan Ge^{1, 2}, Zhili Li^{1, 2, †}, Duo Xiao¹, Piao Xiong¹, and Na Ye¹

¹School of Chemistry & Chemical Engineering, Guangxi University, Nanning 530004, China
²Guangxi Key Laboratory of Petrochemical Resource Processing and Process Intensification Technology, Guangxi University, Nanning 530004, China

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Sulfonated multi-walled carbon nanotubes (s-MWCNTs) was prepared from purified multi-walled carbon nanotubes (p-MWCNTs) by concentrated H2SO4 at elevated temperature. The structure was characterized by SEM, FTIR, Raman, XPS, and BET. It could be dispersed steadily in water at a dosage of 1.0 mg/mL for a week. The adsorption performance of s-MWCNTs toward Cu(II) was investigated including the effects of pH and ionic strength. Results indicated the adsorption was much dependent on pH but not on ionic strength. The adsorption capacity for Cu(II) was enhanced 58.9% via the sulfonation. Moreover, the adsorption mechanisms were carefully analyzed by Freundlich and D-R models.

Keywords:Heavy metal ion;Adsorption;Carbon nanotube;Sulfonation;Wastewater

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Rao GP, Lu C, Su F, Sep. Purif. Technol., 58(1), 224 (2007)
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[Referenced By]

[1] Gerhard I, Monga B, Waldbrenner A, Runnebaum B, J. Toxicol. Environ. Health A, 54, 593 (1998)

[2] Wang YH, Lin SH, Juang RS, J. Hazard. Mater., 102(2-3), 291 (2003)

[3] Wang JL, Chen C, Biotechnol. Adv., 27, 195 (2009)

[4] Erdem E, Karapinar N, Donat R, J. Colloid Interface Sci., 280(2), 309 (2004)

[5] Dabrowski A, Hubicki Z, Podkoscielny P, Robens E, Chemosphere, 56, 91 (2004)

[6] Kapoor A, Viraraghavan T, Cullimore DR, Bioresour. Technol., 70(1), 95 (1999)

[7] Febrianto J, Kosasih AN, Sunarso J, Ju YH, Indraswati N, Ismadji S, J. Hazard. Mater., 162(2-3), 616 (2009)

[8] Dakiky M, Khamis M, Manassra A, Mer’eb M, Adv. Environ. Res., 6, 533 (2002)

[9] Qin LC, Zhao XL, Hirahara K, Miyamoto Y, Ando Y, Iijima S, Nature, 408, 50 (2000)

[10] Zhang Y, Ichihashi T, Landree E, Nihey R, Iijima S, Science, 285, 1719 (1999)

[11] Baughman RH, Zakhidov AA, de Heer WA, Science, 297, 787 (2002)

[12] Liu Z, Tabakman S, Welsher K, Dai HJ, Nano Res., 2, 85 (2009)

[13] El-Sheikh AH, Talanta, 75, 127 (2008)

[14] Li YH, Wang SG, Luan ZK, Ding J, Xu CL, Wu DH, Carbon, 41, 1057 (2003)

[15] Li YH, Wang SG, Wei JQ, Zhang XF, Xu CL, Luan ZK, Wu DH, Wei BQ, Chem. Phys. Lett., 357(3-4), 263 (2002)

[16] Tuzen M, Saygi KO, Soylak M, J. Hazard. Mater., 152(2), 632 (2008)

[17] Li YH, Ding J, Luan Z, Carbon, 41, 2787 (2003)

[18] Hsieh SH, Horng JJ, J. Univ. Sci. Technol. Beijing, Miner. Metall. Mater. 14 (2007) 77.

[19] Yu XY, Luo T, Zhang YX, Jia Y, Zhu BJ, Fu XC, Liu JH, Huang XJ, ACS Appl. Mater. Interfaces, 3, 2585 (2011)

[20] Kandah MI, Meunier JL, J. Hazard. Mater., 146(1-2), 283 (2007)

[21] Yu H, Jin Y, Li Z, Peng F, Wang H, J. Solid State Chem., 181, 432 (2008)

[22] Yu H, Li Z, Zhang C, Peng F, Wang H, J. Nat. Gas Chem., 16, 382 (2007)

[23] Peng F, Zhang L, Wang HJ, Lv P, Yu H, Carbon, 43, 2405 (2005)

[24] Wang YB, Iqbal Z, Mitra S, Carbon, 43, 1015 (2005)

[25] Wang YB, Iqbal Z, Malhotra SV, Chem. Phys. Lett., 402(1-3), 96 (2005)

[26] Ramesh S, Ericson LM, Davis VA, Saini RK, Kittrell C, Pasquali M, Billups WE, Adams WW, Hauge RH, Smalley RE, J. Phys. Chem. B, 108(26), 8794 (2004)

[27] Wang YB, Iqbal Z, Mitra S, J. Am. Chem. Soc., 128(1), 95 (2006)

[28] Socrates G, Infrared and Raman Characteristic Frequencies: Tables and Charts, John Wiley & Sons, New York, 2001p. 220.

[29] Duesberg GS, Graupner R, Downes P, Minett A, Ley L, Roth S, Nicoloso N, Synth. Met., 142, 263 (2004)

[30] Ago H, Kugler T, Cacialli F, Salaneck WR, Shaffer MSP, Windle AH, Friend RH, J. Phys. Chem. B, 103(38), 8116 (1999)

[31] Lu CY, Chiu HS, Chem. Eng. Sci., 61(4), 1138 (2006)

[32] Zhou D, Chow L, J. Appl. Phys., 93, 9972 (2003)

[33] Wu CH, J. Colloid Interface Sci., 311(2), 338 (2007)

[34] Rao GP, Lu C, Su F, Sep. Purif. Technol., 58(1), 224 (2007)

[35] Sheng GD, Li JX, Shao DD, Hu J, Chen CL, Chen YX, Wang XK, J. Hazard. Mater., 178(1-3), 333 (2010)

[36] Hayes KF, Leckie JO, J. Colloid Interface Sci., 115, 564 (1987)

[37] Shao DD, Hu J, Wang XK, Plasma Process. Polymer, 7, 977 (2010)

[38] Lasheen MR, Ammar NS, Ibrahim HS, Solid State Sci., 14, 202 (2012)

[39] Dlamini DS, Mishra AK, Mamba BB, Mater. Chem. Phys., 133(1), 369 (2012)