Previous Article Next Article Table of Contents Advanced Materials, Vol.25, No.34, 4690-4695, 2013 DOI10.1002/adma.201301556 Export Citation Line Patterns from Cylinder-Forming Photocleavable Block Copolymers Gu WY, Zhao H, Wei QS, Coughlin EB, Theato P, Russell TP Keywords:block copolymers;line patterns;self-assembly;photocleavable;nanotemplates Please enable JavaScript to view the comments powered by Disqus.
