Very thin ZrC and ZrN films (<500 nm) were grown on (1 0 0) Si substrates at 500 degrees C by the pulsed laser deposition (PLD) technique using a KrF excimer laser. X-ray reflectivity investigations showed that films exhibited mass densities similar to bulk values. X-ray diffraction investigations found that films were nanocristalline, exhibited a (1 1 1) texture and high micro-strain values. Auger electron spectroscopy investigations indicated that films contained in bulk a relatively low oxygen concentration, usually below 2.0%. Atomic force microscopy found that ZrN films deposited under 2 X 10(-2) Pa of N-2 exhibited a very smooth surface, with an rms value of only 3 angstrom, while wear tests found a low wear rate of only 4.5 X 10(-6) mm(3)/N m. (C) 2014 Elsevier B.V. All rights reserved.