This paper reports about the zirconia (ZrO2)-silica (SiO2) composite membrane prepared by the chemical vapor deposition (CVD) method. A porous alumina tube having a pore size of 100 nm was modified by CVD using the precursor solution (mixture solution of zirconium n-butoxide and tetraethylorthosilicate with weight percent of 1:1) as a ZrO2-SiO2 composite source. The CVD treatment was carried out at 600 degrees C, 650 degrees C and 700 degrees C. The single-component with the presence of H-2 and N-2 gases in the prepared Zr-Si composite membrane was measured at 300-600 degrees C. Hydrogen presence at 600 degrees C was about 7.3 x 10(-8) mol (m(2) Pa s)(-1) and 2.7 x 10(-8) mol (m(2) Pa s)(-1) for ZS650-2 and ZS700 membrane, respectively. The H-2/N-2 gases selectivity at 600 degrees C were 24.5 and 35.8 for the ZS650-2 and ZS700 membrane, respectively. The stability test was carried out at 450 degrees C with an increase of exposure time in the water vapor. It was confirmed that permeances of H-2 and N-2 gases at through the prepared ZrO2-SiO2 composite membrane did not change with an increase of exposure time in the presence of water vapor. (C) 2013 Elsevier B.V. All rights reserved.