Poly(vinyl butyral)에 azide기가 도입된 감광성 고분자의 합성 및 감광특성

박이순; 한윤수; 오현식; 임대환

Journal of the Korean Industrial and Engineering Chemistry, Vol.9, No.7, 1053-1058, December, 1998

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Poly(vinyl butyral)에 azide기가 도입된 감광성 고분자의 합성 및 감광특성

Synthesis and Photochemical Properties of Photosensitive Poly(vinyl butyral) with Azide Group

박이순, 한윤수, 오현식, 임대환

초록

Poly(vinyl alcohol)(PVA)와 n-butylaldehyde를 산촉매하에서 반응시켜 butyral unit의 함량이 서로 다른 poly(vinyl butyral)(PVB)를 합성하였으며, PVB내 butyral unit의 함량은 원소분석으로부터 결정하였다. 합성된 PVB와 p-azidobenzaldehyde를 산촉매하에서 반응시켜 azidobenzene기가 도입된 감광성수지(PVB-AZ)를 합성하였으며, PVB-AZ내 azidobenzene기의 함량은 UV 분광분석법으로 결정하였다. 합성된 PVB-AZ의 감광특성, 열적성질 및 용해특성을 조사하였으며, 상대감도 변화를 gray scale(GS)법으로 조사하였다. PVB-AZ내 butyral unit의 함량, azidobenzene기의 함량 및 현상용매에 따라 GS법에 의한 상대감도가 서로 다르게 나타났으며, 공유결합으로 감광기가 도입된 감광성수지(PVB-AZ)의 감도는 PVB에 감광제인 2,6-bis(p-azidobenzylidene) cyclohexanone(BAC)가 혼합된 감광성수지(PVB-BAC)보다 우수하였다.

Poly(vinyl butyral)s (PVB) with different butyral content were synthesized from poly(vinyl alcohol)(PVA) and n-butylaldehyde with acid catalyst. Bound butyral unit in PVB was determined by elemental analysis. Synthesized PVBs were reacted with p-azidobenzaldehyde to give photosensitive polymer with azidobenzene group(PVB-AZ). Bound photosensitive azidobenzene group in PVB-AZ was determined by UV spectrophotometry. The photosensitivity of PVB-AZ was compared with that of PVB/2,6-bis(p-azidobenzylidene)cyclohexanone(BAC) photosensitizer mixture system by gray scale method. Photosensitivity of PVB-AZ was higher than that of PVB/BAC mixture system. The photosensitivity of PVB-AZ was dependent on the developer used due to the solubility of PVB-AZ in a developer solvent.

Keywords:Poly(vinyl butyral);p-azidobenzaldehyde;Photosensitive Polymer;Photosensitivity;Gray Scale Method

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[1] Roffey CG, "Photopolymerization of Surface Coatings," John Wiley & Sons, Ltd., New York (1982)

[2] DeForest WS, "Photoresist; Materials and Process," Jeremy Robinson and Magaret Lamb, Kingsport Press, U.S.A. (1975)

[3] Ianni JD, Naples FJ, Marsh JW, Zarney JL, Ind. Eng. Chem., 38, 1171 (1946)

[4] Agnihotori RK, Falcon DL, Hood FP, Lesoine LG, Needham CD, Offenbach JA, Phot. Sci. Eng., 16, 443 (1972)

[5] Kodak Co, U.S. Patent, 2,940,853 (1960)

[6] Arnost Reiser, "Photoreactive Polymers; The Science and Technology of Resists," p. 189, John Wiley & Sons, New York (1989)

[7] Kodak Co., U.S. Patent, 3,096,311 (1963)

[8] Merrill SH, Unruh CC, J. Appl. Polym. Sci., 7, 273 (1963)

[9] Irving Skeist et al., "Handbook of Adehesives," Third Edition, Ed. by Irving Skeist, p. 423-436, Van Nostrand Reinhold, New York (1990)

[10] Krichedorf HR, "Handbook of Polymer Synthesis," Part B, ed. by Hans R. Kricheldorf, p. 1506-1508, Marcel Dekker, Inc., New York (1991)

[11] Rosen SL, "Fundamental Principles of Polymeric Materials," Second Edition, Technical Volumes Committee, p. 41, John Wiley & Sons, Inc., New York (1993)