The kinetics of adsorption and abstraction for the system H(D) on Al(111) and Ni(111) has been investigated using an efficient atomic beam source, thermal desorption spectroscopy, and multiplex-ed mass spectrometry. The initial sticking coefficient of atomic hydrogen on Ni(111) is 1.0 and independent of the angle of incidence. For H on AI(111) the initial sticking coefficient is 0.6 and increases with increasing angle of incidence (S(phi)similar to cos(-0.4) phi). On Al(111) preadsorbed oxygen leads to a decrease of the initial sticking coefiicient for H down to 0.1; potassium on the other hand has no significant influence on the initial sticking probability. On both surfaces, Ni(111) and Al(111), abstraction of deuterium proceeds at a surface temperature of 150 K due to impinging H atoms (H + D-->HD), with an initial abstraction coefficient of 0.20 on Al(111) and 0.12 on Ni(111). In the case of Al(111) this coefficient is nearly independent of the initial D coverage and therefore the abstraction reaction cannot be described by a simple Eley-Rideal process, but rather by a hot-precursor mechanism. In addition to abstraction there is also a small probability for the removal of an adsorbed species by a collision induced desorption process. Abstraction of deuterium by impinging H-atoms is strongly affected by modification of the Al(111) surface, either by oxygen or by potassium. Oxygen decreases the HD abstraction coefficient, probably by inhibiting the hot-precursor state of I-I on the surface. Potassium increases the HD abstraction rate, most likely by increasing the lifetime of atomic hydrogen in the precursor state.