Journal of Power Sources, Vol.202, 47-55, 2012
Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition
Thin film growth of yttria stabilized zirconia (YSZ) using atmospheric aerosol assisted chemical vapor deposition (AA-CVD) from beta-diketonates is studied. The influence of nature and concentration of metal precursors and solvents on thin film growth, microstructure and composition is investigated as a function of deposition temperature. AA-CVD is able to produce smooth and homogeneous YSZ thin films of controlled thickness and stoichiometry. Amorphous, nanocrystalline or columnar microstructures can be obtained at deposition temperatures between 300 and 650 degrees C. In the same temperature regime, a transition from surface reaction to diffusion controlled film growth is observed. For applications as gas separating membranes, e.g. for micro-solid oxide fuel cell electrolytes, randomly oriented nanocrystalline microstructures with grain sizes in the range of 10 nm are promising. (C) 2011 Elsevier B.V. All rights reserved.