Better control of colloidal assembly by convective deposition is particularly helpful in particle templating. However, knowledge of the different factors that can alter colloidal patterning mechanisms is still insufficient. Deposit morphology is strongly ruled by contact line dynamics, but the wettability properties of the substrate can alter it drastically. In this work, we experimentally examined the roles of substrate contact angle hysteresis and receding contact angle using driven evaporating menisci similar to the dip-coating technique but at a low capillary number. We used smooth substrates with very different wettability properties and nanoparticles of different sizes. For fixed withdrawal velocity, evaporation conditions, and nanoparticle concentration, we analyzed the morphology of the deposits formed on each substrate. A gradual transition from stripe-like patterns to a film was observed as the contact angle hysteresis and receding contact angle were lowered.