The texture evolution due to grain growth was investigated in a nanocrystalline 99.9% Ni foil fabricated by using an electrodeposition method. The as-deposited texture was characterized by a strong <100>//ND fibre and a weak <111>//ND fibre. Grain growth occurred during annealing beyond 200degreesC and resulted in the texture change that the <111>//ND fibre strongly developed at the expense of the <100>//ND fibre. It was examined with the aids of in situ synchrotron X-ray diffraction that in the as-deposited state, the energy density of the <100>//ND grains was higher by about 1 J/mole than that of the <111>//ND grains. It was concluded that the rapid growth of the <111>//ND grains due to their lowest energy density in the as-deposited state resulted in the strong development of the {111} annealing texture. Orientation dependency of the coefficient of thermal expansion during annealing was measured and discussed in terms of its relation to grain growth.