Preparation of RuO2/Ti electrodes has been carried out using RuBr3 and RuI3 as precursors as an alternative to the RuCl3 precursor which is often used for the thermal preparation of RuO2 layer. A detailed compositional and microstructural characterization of the samples has been performed, which allows for a comparison of their final properties. Analysis of the charge of RuO2 films by cyclic voltammetry shown that RuO2 films formed by thermal decomposition of RuBr3 precursor possess the highest electrochemically active surface area.