Growth and characterization of epitaxial wurtzite Al1-xInxN thin films deposited by UHV reactive dual DC magnetron sputtering

Seppanen T; Radnoczi GZ; Tungasmita S; Hultman L; Birch J

Materials Science Forum, Vol.433-4, 987-990, 2002

Seppanen T, Radnoczi GZ, Tungasmita S, Hultman L, Birch J

Ternary Al1-xInxN thin films were grown by dual target direct current (DC) reactive magnetron sputtering under UHV conditions. The film compositions were determined to range from 0.30

Keywords:AlN;AllnN;cathodoluminescence;epitaxial growth;HREM;InN;magnetron sputtering;thin films;XRD