화학공학소재연구정보센터
Solid-State Electronics, Vol.98, 38-44, 2014
Three-state resistive switching in HfO2-based RRAM
We investigate the reset transition of HfO2-based REAM structures with emphasis on revealing three-state resistive switching effects. We study nonpolar switching in Pt/HfO2/Pt and unipolar/bipolar switching in Pt/Ti/HfO2/Pt structures, respectively. However, three-state resistive switching is only confirmed in the former case by means of various reset methodologies. Using two-step reset experiments it is shown that the transition to the complete reset state occurs at higher voltages if the CF first drops to the intermediate state. (C) 2014 Elsevier Ltd. All rights reserved.