New methacrylate monomer, 4-methacryloyloxyphenyl-3'-methylstyryl ketone (MPMSK) containing pendant chalcone moiety was synthesized by reacting 4-hydroxyphenyl-3'-methylstyryl ketone (HPMSK) with methacryloyl chloride in the presence of triethyl amine. The monomer, MPMSK was polymerized in ethyl methyl ketone solution at 70 +/-1 degreesC at nitrogen atmosphere using benzoyl peroxide as a free radical initiator. The polymer was characterized by UV, FT-IR, H-1-NMR and C-13-NMR| spectra. The molecular weights ((M) over bar (w) and (M) over bar (n)) of the polymer were determined by gel permeation chromatography. The thermal stability of the polymer was measured by thermogravimetric analysis in air. The glass transition temperature of the polymer was determined by differential scanning calorimetry. The photosensitivity of the polymer was investigated in various solvents in the presence and absence of various triplet sensitizers. The effect of solvent on the rate of photocrosslinking of the polymer was also studied.