Noria derivatives with pendant methoxy and adamantyl ester moieties (noria(MP)-AD(n)) were synthesized by the substitution reaction of noria analogues with 12 methoxy groups (noria(MP)) and 2-bromoacetyloxy-2-methyladamantane (BMA), and their degrees of introduction of adamantyl ester moieties (DI) could be controlled by the feed ratios of noria(MP) and BMA. The physical properties such as solubility, film-forming ability, and thermal stability of noriaMP-AD(n) were also examined to assess the suitability for application as extreme ultraviolet (EUV)-resist materials. The patterning property of noria(MP)-AD(18) (DI= 18) and noria(MP)-AD(54) (DI= 54) was investigated in an EUV-resist system, and noria(MP)-AD(18) yielded higher resolution than noriaMP-AD54, providing a clear line and space pattern with a resolution of 32 nm and a line-width roughness of 10.5 nm by exposure dose of 9.0 mJ/cm(2). (C) 2013 Elsevier B.V. All rights reserved.