Co-N thin films with thickness of 80 nm were deposited using direct current magnetron sputtering at different N-2 partial pressures (PP). The composition, structure and magnetic properties were characterized using Rutherford Backscattering Spectrometry, X-ray Diffraction, Atomic ForceMicroscopy andMagnetometry. The magnetic properties vary with the nitrogen content of the film, determined by the N-2 PP used for deposition, and are correlatedwith the cobalt content of the film. The magnetic phases Co4 + N-x and Co3N were identified as responsible for the variation of the magnetization values. (C) 2014 Elsevier B.V. All rights reserved.