The electrical and microstructure properties of cerium doped indium tin oxide (ITO: Ce) ultrathin films were evaluated to assess their potential application in touch sensors. 10 to 150-nm ITO and ITO: Ce films were deposited on glass substrates (200 C) by DC magnetron sputtering using different ITO targets (doped with CeO2: 0, 1, 3, 5 wt.%). ITO: Ce (doped with CeO2: 3 wt.%) films with thickness < 25 nm showed lower resistivity than ITO. This lower resistivitywas accompanied by a significant increase in the Hall mobility despite a decrease in crystallinity. In addition, the surface morphology and wetting properties improved with increasing Ce concentration. This is related to an earlier transition from an island structure to continuous film formation caused by an increase in the initial nucleation density. (C) 2013 Elsevier B.V. All rights reserved.