화학공학소재연구정보센터
Thin Solid Films, Vol.562, 314-318, 2014
Regulation of the phase transition temperature of VO2 thin films deposited by reactive magnetron sputtering without doping
Thin films of phase pure VO2(M) were fabricated on quartz glass by reactive magnetron sputtering. Structural, morphological, electrical and optical properties of the prepared samples were characterized. Interestingly, it was found that the phase transition temperature can be regulated to a large scale from 46 degrees C to 72 degrees C only by precisely controlling the oxygen partial pressure without any element doping. It was assumed that changes in the amount of free electrons and internal strain introduced by the tiny change in the oxygen-to-vanadium ratio contributed to the significantly regulated phase transition behavior. (C) 2014 Published by Elsevier B.V.