This paper discusses the removal of chemically amplified negative-tone i-line resist SU-8 using hydrogen radicals generated by the catalytic decomposition of H-2 molecules in H-2/N-2 mixed gas ( H-2:N-2 = 10:90 vol.%) using a tungsten hot-wire catalyzer. SU-8 resists with exposure doses from 7 to 280 mJ/cm(2) were removed by hydrogen radicals, although the SU-8 removal rate was independent of the exposure dose. The SU-8 removal rate increased with both substrate and catalyzer temperature, in addition to a decrease in the distance between the catalyzer and substrate. A high removal rate for cross-linked SU-8 with an exposure dose of 14 mJ/cm(2) of approximately 4 mu m/min was achieved with a catalyzer to substrate distance of 20 mm, and catalyzer and initial substrate temperatures of 2400 and 165 degrees C, respectively. (C) 2014 Elsevier B.V. All rights reserved.