흡착입자간 상호작용에 따른 흡착등온선 패턴

김철호; Cheol Ho Kim

Korean Journal of Materials Research, Vol.23, No.8, 462-468, August, 2013

DOI10.3740/MRSK.2013.23.8.462 Export Citation

흡착입자간 상호작용에 따른 흡착등온선 패턴

Adsorption Isotherm Patterns According to the Interactions Between Adsorbed Particles

김철호^†

호남대학교 전자광공학과

Cheol Ho Kim^†

Department of Electronic and Optical Engineering, Honam University, Gwangju 506-714, Korea

E-mail:

We study and describe-from the point of view of the interactions of the adsorbed particles-three types of the adsorption isotherms, namely, Langmuir type adsorption isotherms, phase transition type adsorption isotherms, and adsorption limited type adsorption isotherms, which are observed by experiments. By introducing and using a one dimensional statistical occupancy model, we derived analytical adsorption isotherms for the no force, the attractive force, and the repulsive force exerted on the other adsorbed particles. Our derived adsorption isotherms qualitatively pretty well agree with the experimental results of the adsorption isotherms. To specify each adsorption type, Langmuir type adsorption is a phenomenon that occurs with no forces between the adsorbed particles, phase transition type adsorption is a phenomenon that occurs with the strong attractive forces between the adsorbed particles, and adsorption limited type adsorption is a phenomenon that occurs with the repulsive forces between the adsorbed particles. The theoretical analysis-only using fundamental thermodynamics and occupancy statistics though-qualitatively quite well explains the experimental results.

Keywords:adsorption isotherm;adsorbed particle;attractive force;repulsive force;occupancy statistics;surface phase transition;computer simulation

[References]

Zangwill A, Physics at Surfaces, Cambridge Univ. Press, London. (1988)
Keii T, Adsorption, Chap. 3, Kyoritsu, Tokyo (1986)
Morishige K, Kittaka S, T. Morimoto, Surf. Sci., 148, 401 (1984)
Takaishi T, Mohri M, JCS Faraday Trans. I, 68, 1921 (1972)
Kim C, J. Kor. Asso. Cryst. Growth, 7, 573 (1997)
Nadal L, Lopez GE, Int. J. Interface Chem. and Phys., 98, 905 (2000)
Aranovich GL, Wetzel TE, Donohue MD, J. Phys. Chem. B, 109(20), 10189 (2005)
Hamdaoui O, Naffrechoux E, J. Hazard. Mater., 147(1-2), 381 (2007)
Binder K, Landau DP, Surf. Sci., 108, 503 (1981)
Roelofs LD, Chemistry and Physics of Solid Surfaces, Vol. 4, Springer-Verlag, Berlin (1982). (1982)
Pathria RK, Statistical Mechanics, Chap. 4, Pergamon Press, New York (1972). (1972)
Lichtman D, McQuistan RB, J. Mach. Phys., 8, 2441 (1967)
Kinbara A, Fujiwara H, Thin Films, Chap. 2, Shokabo, Tokyo. (1988)

[1] Zangwill A, Physics at Surfaces, Cambridge Univ. Press, London. (1988)

[2] Keii T, Adsorption, Chap. 3, Kyoritsu, Tokyo (1986)

[3] Morishige K, Kittaka S, T. Morimoto, Surf. Sci., 148, 401 (1984)

[4] Takaishi T, Mohri M, JCS Faraday Trans. I, 68, 1921 (1972)

[5] Kim C, J. Kor. Asso. Cryst. Growth, 7, 573 (1997)

[6] Nadal L, Lopez GE, Int. J. Interface Chem. and Phys., 98, 905 (2000)

[7] Aranovich GL, Wetzel TE, Donohue MD, J. Phys. Chem. B, 109(20), 10189 (2005)

[8] Hamdaoui O, Naffrechoux E, J. Hazard. Mater., 147(1-2), 381 (2007)

[9] Binder K, Landau DP, Surf. Sci., 108, 503 (1981)

[10] Roelofs LD, Chemistry and Physics of Solid Surfaces, Vol. 4, Springer-Verlag, Berlin (1982). (1982)

[11] Pathria RK, Statistical Mechanics, Chap. 4, Pergamon Press, New York (1972). (1972)

[12] Lichtman D, McQuistan RB, J. Mach. Phys., 8, 2441 (1967)

[13] Kinbara A, Fujiwara H, Thin Films, Chap. 2, Shokabo, Tokyo. (1988)