Korean Journal of Materials Research, Vol.21, No.2, 120-124, February, 2011
실리콘 이종 접합 태양 전지 특성에 대한 ZnO:Al과 비정질 실리콘 계면 반응의 영향
Effect of Interface Reaction between ZnO:Al and Amorphous Silicon on Silicon Heterojunction Solar Cells
E-mail:
Silicon heterojunction solar cells have been studied by many research groups. In this work, silicon heterojunction solar cells having a simple structure of Ag/ZnO:Al/n type a-Si:H/p type c-Si/Al were fabricated. Samples were fabricated to investigate the effect of transparent conductive oxide growth conditions on the interface between ZnO:Al layer and a-Si:H layer. One sample was deposited by ZnO:Al at low working pressure. The other sample was deposited by ZnO:Al at alternating high working pressure and low working pressure. Electrical properties and chemical properties were investigated by light I-V characteristics and AES method, respectively. The light I-V characteristics showed better efficiency on sample deposited by ZnO:Al by alternating high working pressure and low working pressure. Atomic concentrations and relative oxidation states of Si, O, and Zn were analyzed by AES method. For poor efficiency samples, Si was diffused into ZnO:Al layer and O was diffused at the interface of ZnO:Al and Si. Differentiated O KLL spectra, Zn LMM spectra, and Si KLL spectra were used for interface reaction and oxidation state. According to AES spectra, sample deposited by high working pressure was effective at reducing the interface reaction and the Si diffusion. Consequently, the efficiency was improved by suppressing the SiOx formation at the interface.
- Zhao J, Wang A, Green MA, Ferrazza F, Appl. Phys. Lett., 73, 1991 (1998)
- Rose D, Koehler O, Kaminar N, Mulligan B, King D, in Proceedings of IEEE 4th World Conference on Photovoltaic Energy Conversion (Waikoloa, HI, May 2006), p. 2018. (2018)
- Sawada T, Terada N, Tsuge S, Baba T, Takahama T, Wakisaka K, Tsuda S, Nakano S, in Proceedings of IEEE 1st World Conference on Photovoltaic Energy Conversion (Waikoloa, HI, December 1994). p. 1219. (1994)
- Branz HM, Teplin CW, Young DL, Page MR, Iwaniczko E, Roybal L, Bauer R, Mahan AH, Xu Y, Stradins P, Wang T, Wang Q, Thin Solid Films, 516(5), 743 (2008)
- Schmidt M, Korte L, Laades A, Stangl R, Schubert CH, Thin Solid Films, 515(19), 7475 (2007)
- Centurioni E, Iencinella D, IEEE Electron Device Lett., 24(3), 177 (2003)
- Centurioni E, Iencinella D, Rizzoli R, Zignani F, IEEE Trans. Electron Dev., 51(11), 1818 (2004)
- Fujiwara H, Kondo M, Appl. Phys. Lett., 86, 032112 (2005)
- Maydell K, Korte L, Laades A, Stangl R, Conrad E, Lange F, Schmidt M, J. Non-Cryst. Solids, 352(9-20), 1958 (2006)
- Pla J, Tamasi M, Rizzoli R, Losurdo M, Centurioni E, Summonte C, Rubinelli F, Thin Solid Films, 425(1-2), 185 (2003)
- Christensen JS, Ulyashin AG, Maknys K, Kuznetsov AY, Svensson BG, Thin Solid Films, 511-512, 93 (2006)
- Maknys K, Ulyashin AG, Stiebig H, Kuznetsov AY, Svensson BG, Thin Solid Films, 511-512, 98 (2006)