화학공학소재연구정보센터
Korean Journal of Materials Research, Vol.20, No.10, 550-554, October, 2010
나노 구체 리소그라피법에 Ashing과 Annealing 효과를 적용하여 크기조절 가능한 나노패턴의 제조
Size Tunable Nano Patterns Using Nanosphere Lithography with Ashing and Annealing Effect
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This work presents a fabrication procedure to make large-area, size-tunable, periodically different shape metal arrays using nanosphere lithography (NSL) combined with ashing and annealing. A polystyrene (PS, 580 μm) monolayer, which was used as a mask, was obtained with a mixed solution of PS in methanol by multi-step spin coating. The mask morphology was changed by oxygen RIE (Reactive Ion Etching) ashing and temperature processing by microwave heating. The Au or Pt deposition resulted in size tunable nano patterns with different morphologies such as hole and dots. These processes allow outstanding control of the size and morphology of the particles. Various sizes of hole patterns were obtained by reducing the size of the PS sphere through the ashing process, and by increasing the size of the PS sphere through annealing treatment, which resulted in tcontrolling the size of the metallic nanoparticles from 30 nm to 230 nm.
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