Korean Journal of Materials Research, Vol.15, No.5, 293-300, May, 2005
펄스 레이저 증착법에 의한 ZnO:Li 박막 성장과 열처리 효과
Effect of Thermal Annealing and Growth of ZnO:Li Thin Film by Pulesd Laser Deposition
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ZnO:Li epilayers were synthesized on sapphire substrates by the pulesd laser deposition (PLD) after the surface of the ZnO:Li sintered pellet was irradiated by the ArF (193 nm) excimer laser. The growth temperature was fixed at 400 ? C . The crystalline structure of epilayers was investigated by the photoluminescence (PL) and double crystal X-ray diffraction (DCXD). The carrier density and mobility of epilayers measured by van der Pauw-Hall method are 2.69×10cm ?3 and 52.137cm 2 /V?s at 293 K, respectively. The temperature dependence of the energy band gap of epilayers obtained from the absorption spectra is well described by the Varshni's relation, E g (T)=3.5128eV?(9.51×10 ?4 eV/K)T 2 /(T+280K) . After the as-grown ZnO:Li epilayer was annealed in Zn atmospheres, oxygen and vaccum the origin of point defects of ZnO:Li has been investigated by PL at 10 K. The Peaks of native defects of V zn ,V o ,Zn int ,andO int showned on PL spectrum are classified as a donors or accepters type. We confirm that ZnO:Li/Al 2 O 3 in vacuum do not form the native defects because ZnO:Li epilayers in vacuum existe in the form of stable bonds.
Keywords:ZnO:Li epilayers;pulesd laser deposition;annealing;Hall effect point defect;photoluminescence
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