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Korean Journal of Materials Research, Vol.13, No.4, 205-212, April, 2003
RF 스퍼터링용 Hydroxyapatite 타겟의 제조 및 Hydroxyapatite/Ti-6Al-4V 합금 박막의 특성(I)
The Fabrication of Hydroxyapatite Targets and the Characteristics of Hydroxyapatite/Ti-6Al-4V Alloy Thin Films by RF Sputtering(I)
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RF sputtering process was applied to produce thin hydroxyapatite[HA, Ca10( PO 4 ) 6 (OH) 2 films on Ti-6Al-4V alloy substrates. To make a 101.6 mm dia. × 5 mm HA target, the commercial HA powder was first calcinated for 3h at 200 ? C . A certain amount of the calcinated HA powder was pressed under a pressure of 20,000 psi by the cold isostatic press(CIP) and the pressed HA target was sintered for 6 h at 1,200 ? C . The effects of different heat treating conditions on the bonding strength between HA thin films and Ti-6Al-4V alloy substrates were studied. Before deposition, the alloy substrates were annealed for 1 h at 850 ? C under 3.0 {\times}10 ?3 Xtorr, and after deposition, the hydroxyapatite/Ti-6Al-4V alloy thin films were annealed for 1 h at 400, 600 and 800 ? C under the atmosphere, respectively. Experimental results represented that the HA thin films on the annealed substrates had higher hardness than non-heat treated substrates before the deposition.
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