열처리에 따른 강자성 터널링 접합의 국소전도특성

윤대식; Masakiyo Tsunoda; Migaku Takahashi; 이영; 박범찬; 김철기; 김종오; Tae-Sick Yoon; Masakiyo Tsunoda; Takahashi Migaku; Ying Li; Bum-Chan Park; Cheol-Gi Kim; Chong-Oh Kim

Korean Journal of Materials Research, Vol.13, No.4, 233-238, April, 2003

DOI10.3740/MRSK.2003.13.4.233 Export Citation

열처리에 따른 강자성 터널링 접합의 국소전도특성

Effects of Annealing Temperature on the Local Current Conduction of Ferromagnetic Tunnel Junction

윤대식^†, Masakiyo Tsunoda¹, Migaku Takahashi¹, 이영, 박범찬, 김철기, 김종오

고기능성 자성재료 연구센터
¹Tohoku University

Tae-Sick Yoon^†, Masakiyo Tsunoda¹, Takahashi Migaku¹, Ying Li², Bum-Chan Park, Cheol-Gi Kim, and Chong-Oh Kim

Research Center for Advenced Magnetic Materials, Chungnam National University, Taejeon 305-764, Korea
¹Department of Electronics Engineering, Tohoku University, Sendai 980-8579, Japan
²Institute of Materials, School of Materials Science and Engineering, Shanghai University, P.R. China, Korea

E-mail:

Ferromagnetic tunnel junctions, Ta/Cu/Ta/NiFe/Cu/ Mn 75 Ir 25 Co 70 Fe 30 /Al-oxide, were fabricated by do magnetron sputtering and plasma oxidation process. The effect of annealing temperature on the local transport properties of the ferromagnetic tunnel junctions was studied using contact-mode Atomic Force Microscopy (AFM). The current images reflected the distribution of the barrier height determined by local I-V analysis. The contrast of the current image became more homogeneous and smooth after annealing at 280 ? C . And the average barrier height ? ave increased and its standard deviation σ ? X decreased. For the cases of the annealing temperature more than 300 ? C , the contrast of the current image became large again. And the average barrier height ? ave decreased and its standard deviation σ ? increased. Also, the current histogram had a long tail in the high current region and became asymmetric. This result means the generation of the leakage current that is resulted from the local generation of a low barrier height region. In order to obtain the high tunnel magnetoresistance(TMR) ratio, the increase of the average barrier height and the decrease of the barrier height fluctuation must be strictly controlled.led.

Keywords:TMR;contact AFM;Local transport;Current image;Annealing

[References]

Hanm HF, Oogane M, Kubota H, Ando Y, Miyazaki T, Appl. Phys. Lett., 77, 283 (1991)
Han HF, Daibou T, Kamijo M, Yaoita K, Kubota H, Ando Y, Miyazaki T, Jpn. J. Appl. Phys., 39, L439 (2000)
Tehrani S, Slaughter JM, Chen E, Durlam N, Shi J, Deherrera M, IEEE Trans. Magn., 35, 2814 (1999)
Slonczewski JC, Phys. Rev. B, 39, 6995 (1989)
Ando Y, Kameda H, Hayashi M, Kubota H, Miyazaki T, J. Magn. Soc. Japan., 24, 611 (2000)
Han XF, Daibou T, Kamijo M, Yaoita K, Kubota H, Ando Y, Miyazaki T, Jpn. J. Appl. Phys., 39, L439 (2000)
Kubota H, Watabe T, Fukumoto Y, Miyazaki T, J. Magn. Soc. Japan, 23, 67 (1999)
Yuasa S, Sato T, Tamura T, Suzuki Y, Yamamori H, Ando K, Katayama T, Europhys. Lett., 52, 344 (2000)
Nakashio E, Sugawara J, Onoue S, Kumagai S, IEEE Trans. Magn., 36, 2812 (2000)
Goto N, Yamamoto M, Inst. Electr. Commnu. Eng. Tech. Rep., AP80-57, 43 (1980)
Yamamoto T, Chien NT, Ando M, Goto N, Hirayama M, Ohmi T, Jpn. J. Appl. Phys., 38, 2082 (1999)
Saito Y, Sekine K, Hirayama M, Ohmi T, Jpn. J. Appl. Phys., 38, 2329 (1999)
Nishikawa K, Ogata S, Syoyama T, Cho WS, Yoon TS, Tsunoda M, Takahashi M, Journal of Magnetics, 7, 63 (2002)
Ohmi T, Sugawa S, Hirayama M, Saito Y, Jpn. J. Appl. Phys., 69, 1200 (2000)
Wiesendanger R, Bode M, Dombrowski R, Getzlaff M, Morgenstern M, Wittneven C, Jpn. J. Appl. Lett., 37, 3769 (1998)
Olbrich A, Ebersberger B, Boit C, Appl. Phys. Lett., 73, 3114 (1998)
Da Costa V, Bardou F, Beal C, Henry Y, Bucher JP, Ounadjela K, J. Appl. Phys., 83, 6703 (1998)
Hayashi M, Ando Y, Kubota H, Miyazaki T, J. Magn. Soc. Japan, 25, 759 (2001)
Ando Y, Kameda H, Kubota H, Miyazaki T, J. Appl. Phys., 87, 5206 (2000)
Yoon TS, Tsunoda M, Takahashi M, Li Y, Kim CG, Kim CO, Journal of the Korean Magnetics Society,, (in press)
Ando Y, Kameda H, Kubota H, Miyazaki T, Jpn. J. Appl. Phys., 38, L737 (1999)
Ando Y, Kubota H, Hayashi M, Kamijo M, Yaoita K, Yu ACC, Han XF, Miyazaki T, Jpn. J. Appl. Phys., 39, 5832 (2000)

[Referenced By]

[1] Hanm HF, Oogane M, Kubota H, Ando Y, Miyazaki T, Appl. Phys. Lett., 77, 283 (1991)

[2] Han HF, Daibou T, Kamijo M, Yaoita K, Kubota H, Ando Y, Miyazaki T, Jpn. J. Appl. Phys., 39, L439 (2000)

[3] Tehrani S, Slaughter JM, Chen E, Durlam N, Shi J, Deherrera M, IEEE Trans. Magn., 35, 2814 (1999)

[4] Slonczewski JC, Phys. Rev. B, 39, 6995 (1989)

[5] Ando Y, Kameda H, Hayashi M, Kubota H, Miyazaki T, J. Magn. Soc. Japan., 24, 611 (2000)

[6] Han XF, Daibou T, Kamijo M, Yaoita K, Kubota H, Ando Y, Miyazaki T, Jpn. J. Appl. Phys., 39, L439 (2000)

[7] Kubota H, Watabe T, Fukumoto Y, Miyazaki T, J. Magn. Soc. Japan, 23, 67 (1999)

[8] Yuasa S, Sato T, Tamura T, Suzuki Y, Yamamori H, Ando K, Katayama T, Europhys. Lett., 52, 344 (2000)

[9] Nakashio E, Sugawara J, Onoue S, Kumagai S, IEEE Trans. Magn., 36, 2812 (2000)

[10] Goto N, Yamamoto M, Inst. Electr. Commnu. Eng. Tech. Rep., AP80-57, 43 (1980)

[11] Yamamoto T, Chien NT, Ando M, Goto N, Hirayama M, Ohmi T, Jpn. J. Appl. Phys., 38, 2082 (1999)

[12] Saito Y, Sekine K, Hirayama M, Ohmi T, Jpn. J. Appl. Phys., 38, 2329 (1999)

[13] Nishikawa K, Ogata S, Syoyama T, Cho WS, Yoon TS, Tsunoda M, Takahashi M, Journal of Magnetics, 7, 63 (2002)

[14] Ohmi T, Sugawa S, Hirayama M, Saito Y, Jpn. J. Appl. Phys., 69, 1200 (2000)

[15] Wiesendanger R, Bode M, Dombrowski R, Getzlaff M, Morgenstern M, Wittneven C, Jpn. J. Appl. Lett., 37, 3769 (1998)

[16] Olbrich A, Ebersberger B, Boit C, Appl. Phys. Lett., 73, 3114 (1998)

[17] Da Costa V, Bardou F, Beal C, Henry Y, Bucher JP, Ounadjela K, J. Appl. Phys., 83, 6703 (1998)

[18] Hayashi M, Ando Y, Kubota H, Miyazaki T, J. Magn. Soc. Japan, 25, 759 (2001)

[19] Ando Y, Kameda H, Kubota H, Miyazaki T, J. Appl. Phys., 87, 5206 (2000)

[20] Yoon TS, Tsunoda M, Takahashi M, Li Y, Kim CG, Kim CO, Journal of the Korean Magnetics Society,, (in press)

[21] Ando Y, Kameda H, Kubota H, Miyazaki T, Jpn. J. Appl. Phys., 38, L737 (1999)

[22] Ando Y, Kubota H, Hayashi M, Kamijo M, Yaoita K, Yu ACC, Han XF, Miyazaki T, Jpn. J. Appl. Phys., 39, 5832 (2000)